Used NISSIN NH-20SR #9144958 for sale

NISSIN NH-20SR is a reliable and efficient ion implanter and monitor equipment specifically designed for high-precision ion implantation applications. The system has been designed to efficiently and accurately monitor implant parameters, automatically control process parameters, and accurately measure important parameters, such as the residual damage of implanted silicon wafers. NISSIN NH 20SR uses a multi-mode ion source, allowing it to efficiently and accurately implant different materials ranging from boron to high atomic number (Z) materials, and includes ion optics control for precise beam manipulation. The unit's ion beam scanner can control the spot size of the ion beam without affecting the ion energy and dose. NH-20SR features a mission computer machine, allowing automated data acquisition, processing, and storage for efficient operation. NH 20SR tool is also outfitted with safety features to protect personnel and sensitive equipment. It includes automatic laser safety interlocks and an energy ion detector. It also has an active residual particle ion monitor to watch for process contamination. NISSIN NH-20SR is able to provide precise control of implant parameters with its powerful automation capabilities. This includes the ability to control pre-implant ion beam current, pre-implant beam energy, post-implant beam current, and post-implant beam energy. The asset can also monitor implant dose and model accuracy. Automated testing capabilities are included, which provide rapid feedback regarding the process quality. NISSIN NH 20SR's monitor systems provide accurate and reliable monitoring of implant process parameters. This includes the ability to measure beam energy and current, beam position, wafer current and resistance, and wafer damage. Specialized monitoring functions are also available, such as dose-dependent recoil range, dose monitor test analysis, and beam transient test analysis. NH-20SR is equipped with powerful data storage and analysis capabilities, which include data storage for implant parameters and batch data archiving. It also supports data analysis and equipment monitoring with real-time display of system information, graph measurements, and data analysis. Overall, NH 20SR is an efficient, accurate, and reliable unit for performing ion implantation and monitoring processes in a variety of applications. Its advanced automation features, powerful monitoring capabilities, and robust data storage and analysis capabilities make it an excellent choice for those seeking precise control and accurate measurements for their implantation needs.