Used NISSIN NH-20SR8 #293642812 for sale

NISSIN NH-20SR8 is a sophisticated ion implanter and monitor equipment designed to provide precise, high-quality implantation of ions into a wide range of substrates. This system is capable of delivering high currents and doses to fixed, variable, or mixed substrates over large areas. It features an automated substrate manipulator (ASM) and is capable of implanting ions of different energies in different dose ranges and at different beam speeds for the precise control of implantation profiles. In terms of performance, NH-20SR8 has a large beam current range of 4-20mA, with a maximum voltage capability of 300 kV. The beam current stabilization time is ≤3 milliseconds, with an ionic energy range of 0.01-200keV. The unit can accommodate up to 6-inch wafers and is also capable of precise manipulation of the substrates to achieve optimal results. NISSIN NH-20SR8 is also integrated with a state-of-the-art ion monitor, which is useful for controlling the ion beam profile and can accurately detect the implanted ions. The monitor accurately measures the dose and current levels of the implanted ions and displays them on the monitor screen in real-time. It also has pre-set programs to provide a variety of implantation and monitoring options. NH-20SR8 is robust, reliable, and offers precise control of the implantation processes. It has built-in safety features, with a lockout mechanism which prevents incorrect operation or damage to the machine in unsafe conditions. Furthermore, it is equipped with a PC/PLC interface for easy integration into industrial automation systems. The tool can also be programmed to connect to other external devices, such as chillers, vacuum pumps, and drives. Overall, NISSIN NH-20SR8 is a powerful and versatile ion implanter and monitor. It has advanced features that ensure the precise control of implantation profiles and monitor accuracy, with robust safety and integration features. This makes it an ideal choice for medium and high-volume production of various substrates.