Used NOVA GEPM 17 #9233716 for sale

NOVA GEPM 17 is an ion implanter and monitor for high-tech industries. It is designed to enable the precision implanting of positive ions into substrates such as silicon semiconductor wafers. This provides the wafers with excellent electrical characteristics which are essential in modern technologies. GEPM 17 is comprised of several components including an ion source, a mass spectrometer, an energy analyzer, as well as several detectors. The ion source generates a beam of ions that are accelerated down the acceleration tube. The mass spectrometer then separates and identifies the species of the ions and measures their energy distribution. The energy analyzer then controls and modifies the kinetic energy of each ion species according to user-defined parameters. Finally, the detectors measure the pressure, current, and the rate of ion beam emission. The user can configure the run parameters of NOVA GEPM 17 through an intuitive software interface. These parameters include the type of ions, their energies, total flux, beam shape, production rate and duration, power supply monitoring, pressure monitoring, as well as other advanced settings. Using these parameters, the user can precisely tune and control the implantation process for wafers of any complexity. GEPM 17 can also monitor and record process data in real-time. Such data includes the temperature and pressure of the system, the current readings of the electrodes, and the beam power. This aids the user in further fine-tuning the process until optimal conditions are achieved. Furthermore, it provides a log of every implantation step that can be used for further analysis and references. Overall, NOVA GEPM 17 is a highly advanced, robust, and reliable ion implantation solution. Its features, monitoring capabilities, and user-friendly software provide a comprehensive and accessible platform for implantation processing, allowing industries to beneficiate from its precision and efficiency.