Used NOVA T4500 #9233674 for sale

NOVA T4500 is an ion implanter and monitor developed by Implant Sciences Inc. It is an industrial-grade implanter and monitor designed for use in the manufacture of semiconductor devices. T4500 is capable of producing high-energy ions with energies ranging from 10 to 5500 keV and dose rates up to 4x106 A/cm2. The equipment has a total ion beam current range between 1 and 4 mA. NOVA T4500 is a continuous flow ion implanter, which means that the ions are continuously fed into the system at one end and then extracted from the other. This eliminates the need to continuously stop and start the unit, which improves throughput and reduces maintenance costs. The machine has two axes of beam current control and two separate regions of ion energy control. This allows for precise control of the ion beam profile, making the tool capable of producing highly uniform ion implanting. T4500 is equipped with advanced ion optical and electronic hardware designed to produce an extremely high level of uniformity in ion beam current and energy across the entire width of the chamber. The asset is also equipped with highly advanced ion optical profiling software which allows for the adjustment of the ion beam profile to ensure precise control over the shape and size of the beam. NOVA T4500 is also equipped with a comprehensive monitoring model which allows for the tracking and analysis of ion implantation parameters in real-time. The monitoring equipment includes features such as beam current and energy, total dose, dose uniformity, leakage current, and temperature data. This allows for precise and consistent control of the implantation process, and ensures that all implants are consistent and of the highest quality. In addition to its implanting and monitoring capabilities, T4500 is also equipped with advanced process control and data analysis tools. These tools allow for the analysis of the implantation process in real time and provide detailed reports of the implantation process, which can be used to combine and correlate changes in the process parameters with changes in the implants. NOVA T4500 is an advanced and highly reliable ion implanter and monitor, designed for use in the most demanding industrial environments. Its combination of advanced ion optical and electronic hardware, monitoring capabilities, and process control and data analysis tools makes it an ideal solution for industrial ion implantation processes.