Used NOVA T500 #9233720 for sale

Manufacturer
NOVA
Model
T500
ID: 9233720
System.
NOVA T500 is an advanced ion implanter and monitor, used for fabricating integrated circuits. It is capable of high speed implantation of ions that are essential for the fabrication of integrated circuits. It uses a high-voltage (HV) beam of ions that is passed through a vacuum chamber to create an ion beam which is directed onto the wafers. The ion beam is then focused onto the individual substrates. T500 utilizes a programmable control equipment to optimize the efficiency of the ion implantation process. NOVA T500 utilizes a scanning system which controls the ion beam by scanning the source and the targets; this allows the beam to be accurately steered to different locations on the substrate. Additionally, a feed-back unit is incorporated to monitor and control the beam parameters such as beam size, shape, energy, and current. This ensures that the beam is properly focused for accurate material deposition on the substrate. T500 also features a multi-zone chamber, which allows for different implantation doses in multiple locations on the substrate. This allows for fine-tuned and uniform material deposition over the entire surface of the substrate. Furthermore, NOVA T500 comes equipped with an advanced ionization chamber which provides complete ionization of the ion source before the implantation process. This allows for more uniformity and accuracy of the ion beam in terms of its parameters. T500 also features a specialized monitoring machine, which monitors the beam parameters and the process environment, in order to detect any variation or abnormality. Furthermore, a real-time diagnostic tool is used to detect any issues in the operation of NOVA T500. This ensures maximum efficiency and reliability throughout the implantation process. T500 is an ideal choice for the fabrication of integrated circuits due to its superior performance, accuracy, and reliability. It provides a powerful and reliable platform for implantation of ions with high precision and uniformity. Plus, its dedicated monitoring asset ensures that the implantation process is carried out accurately and efficiently, providing optimal results.
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