Used PVA TEPLA Evolution II Twin #293605828 for sale

PVA TEPLA Evolution II Twin is a state-of-the-art ion implanter and monitor. It offers superior reliability, high production throughput, and high-quality implantation and monitoring. Its high-powered laser diode technology provides efficient and effective particles processing. Evolution II Twin's modular design allows operators to configure it to implant ions of a specific type into semiconductor wafers. It includes a low-energy modulable ion source, a high-energy modulable ion source, and a pulsed ion source. The low-energy modulable ion source provides the ability to adjust the ion energy and type, and offers a selection of isotopes and ions with variable energies, pulse durations, and modulation capabilities. The high-energy modulable ion source enables operators to vary the ion energy and type during implantation and offers a range of high-energy ions, enabling operations with high-velocity ions. The pulse ion source provides the ability to implant ions of a specific type accurately and quickly. It is capable of implantation with a wide range of pulse durations and energies, allowing for a high-throughput operation with precision implants. PVA TEPLA Evolution II Twin's automated beam transport equipment uses precision computer-controlled electro-mechanical actuators to quickly and accurately transport ions from the sources to the implantation zone. It includes three independent parallel paths, each with its own beam-monitoring system, enabling simultaneous monitoring of each beam during implantation. Another key feature of Evolution II Twin is its advanced cooling unit, which removes heat generated during the implantation process to maintain optimal implantation conditions and ensure reliable results. This cooling machine employs a water-cooled door tool to ensure unrivaled cooling stability. PVA TEPLA Evolution II Twin also features a diagnostic monitor, which allows operators to continually inspect the accuracy of the implantation. Additionally, it offers the ability to perform radioactive measurements and broadcast process data to other computers via its Ethernet interface. In short, Evolution II Twin is a high-performance ion implanter and monitor. Its modular design and array of features allow operators to accurately control the energy and type of ions used for implantation, enabling superior wafer quality. Its robust cooling asset ensures optimal implantation temperatures, while its powerful diagnostics and Ethernet interface ensure reliability and safety.