Used SEN NV-10SD-160 #9181751 for sale

SEN NV-10SD-160 is an ion implanter and monitor developed and manufactured by Shimadzu Corporation for use in semiconductor applications. It is a highly versatile, cost effective, and intuitive equipment that offers superior performance when it comes to implantation. NV-10SD-160 utilizes variable energy stripping (VES) technology to achieve uniform implant profiles through a wide range of targets. Once the target material has been identified, an optimized charging sequence can be set to optimize the transfer efficiency of the maximum desired dose. The system also features a six-axis alignment and compensation unit which makes it possible to produce highly uniform implants in all implant angles. Additionally, the machine is equipped with in-line post-implantation diagnostics which enable users to monitor the low energy stability of the implantation. The tool boasts a maximum efficiency of 160 keV, with a three-stage accelerating voltage of 12, 42 and 160 keV. For each stage, the pitch angle can be adjusted from 0 to 90º to accommodate implants in different orientations. The mechanical beam focussing capabilities allow for optimised beam performance at all times, with a beam divergence of less than 0.1 mrad. With its compact modular design and high power capability, SEN NV-10SD-160 offers ease of installation without taking up a lot of space. The asset provides cooling capabilities to prevent overheating and thermally generated ion implantation artifacts. The model is also fitted with a vacuum feedthrough which enables high production rates, as well as a vacuum equipment that is capable of maintaining a vacuum level of better than 10-7 Torr. In addition, the system is equipped with a sophisticated wafer handler which offers fast and accurate wafer positioning, as well as optimal wafer throughput. NV-10SD-160 is also compatible with a wide range of IC testers and electron microscopes, making it easy to integrate it into a wider production line. Overall, SEN NV-10SD-160 is a powerful and highly versatile ion implanter and monitor which offers excellent stability, controllability, and accuracy when it comes to implanting high-precision and high-yield semiconductor devices.