Used SEN NV-10SD-80 #9181750 for sale

SEN NV-10SD-80 is a state-of-the-art ion implanter and monitor designed to provide an efficient and reliable solution for high-precision ion implantation. It features four implanted ion sources, the main source being a quadrupole ion source with a maximum current of 8mA, which can be used for shallow-angle implantation up to a range of 80 keV. The device also features a secondary source, which is a triode ion source with a current of 1mA, and two additional RF-type ion sources. NV-10SD-80 is capable of high-speed scanning and programming of ion beam dose and parameters, and also provides closed-loop feedback on beam current, energy, and dose. It utilizes a 3-axis in-vacuum manipulator to facilitate loading/unloading of samples. In addition, SEN NV-10SD-80 is equipped with a digital monitor for real-time control of the implantation process. This monitor provides a user-friendly interface for the operator to configure implantation parameters, as well as to monitor and control ion beam current, energy and dose parameters. It also has a built-in safety system which allows a safe and reliable implementation process. NV-10SD-80 guarantees high precision and dose accuracy due to its integrated precision encoders and microprocessor-based control systems. It also features a temperature-controlled ion source chamber and a low-vacuum chamber for the sample holders. Moreover, the device is equipped with a high-speed automated data acquisition and analysis system which allows for generation of detailed results for each sample. SEN NV-10SD-80 is designed for a wide range of applications in the fields of electronics, semiconductor fabrication, and other industrial processes. It can be used to perform various implantation processes, such as substrate-level doping, thin-film deposition, interfacing layers, and surface treatment. Overall, NV-10SD-80 is an efficient and reliable ion implanter and monitor which provides precision and accuracy needed for successful implementation processes.