Used SEN / SUMITOMO EATON NOVA / AXCELIS Disk for NV GSD-HE #293649983 for sale

ID: 293649983
Wafer Size: 8"
8".
SEN / SUMITOMO EATON NOVA / AXCELIS Disk for NV GSD-HE (GSD-HE) is an ion implanter and monitor designed for high-volume material processing. It is used to deposit and monitor atomized particles for a variety of applications, including semiconductor fabrication, microelectronic device production and ion implantation. The GSD-HE features an advanced resistive-feedback type ion implanter that achieves extremely high-precision operation, due to its optimized equipment design. The system uses a J-shaped ion source for fast, accurate and efficient implantation of the material, irrespective of its size, shape or heterogeneity. The GSD-HE also employs advanced substrate support, providing three-dimensional substrate control, as well as a high-resolution 'Window' monitor, allowing the user to observe deflection of the ion beam over time. The GSD-HE also has high-performance optical detectors, enabling extremely accurate measurement and control of the material being implanted or deposited. The detector consists of a high-resolution CCD camera, accompanied by a vacuum-proof optical shutter which is used to monitor the shape of the ion beam, as well as its contrast. The unit also incorporates a high-precision pressure sensor, allowing for highly accurate gas flow control, providing more efficient operation and enhancing throughput. Additionally, the machine has a thermal-imaging device that is used to precisely determine the temperature of the tool, contributing to its stability. The GSD-HE features an innovative 3D cutter, enabling complex topographical structures, such as 3D raised patterns, with micro-mask resolution. This is a unique feature of the asset, allowing it to efficiently process high-volume, multilayer materials requiring different implantation materials on multiple levels. In operation, the 3D cutter moves the target substrate along X, Y and Z axes, and can precisely adjust the depth and shape of each implantation layer. Additionally, the device can accurately handle very small components, such as those used in microelectronic device assembly, which is an important benefit for high-precision material processing. The GSD-HE features an exceptionally large control and data-processing capacity, making it suitable for large-volume material processes and complex topographical structures. It has a highly capable 64-bit CPU, providing more than 20.5 tera operations (TOPS) of processing power for high-speed, high-accuracy data processing, along with a high-speed random access memory (RAM) and 16GB of flash storage. This highly efficient model also has an Ethernet port, IEEE1394 and two USB ports, allowing connection to the Internet and other external devices - enabling efficient data communication, transfer and storage of information. Overall, SEN Disk for NV GSD-HE is a uniquely advanced ion implanter and monitor, enabling highly precise and complex material processes, such as 3D raised patterns and microelectronic device assembly. Its high-precision and high-throughput equipment design makes it an excellent choice for large-scale material processing applications, allowing users to achieve exceptionally accurate and reliable results.
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