Used SEN / SUMITOMO EATON NOVA / AXCELIS NV-GSD-80 #293636198 for sale

SEN / SUMITOMO EATON NOVA / AXCELIS NV-GSD-80 is a highly efficient and precise ion implanter and monitor. It is designed to make the fabrication of semiconductor devices straightforward and accurate. SEN NV-GSD-80 is based on two essential processes: beam scanning and rotation. The first process, beam scanning, is used to implant ions into the wafer while the second process, rotation, is used to spin the wafer and maintain uniform coverage on the substrate. AXCELIS NV-GSD-80 is built with a wide range of beam diameters ranging from 20mm to 1150 mm. That allows for precise control of the dose rate and angular range of the implanted particles. This ensures that the desired implantation is achieved without causing any damage to the substrate. NV-GSD-80 is equipped with a power supply that is capable of taking in up to 120kV. The generator is capable of producing high voltage that reaches peak currents of up to 2A. This allows for precise implantation of a wide range of ions such as phosphorous, boron, carbon and oxygen. The monitor of SUMITOMO EATON NOVA NV-GSD-80 is designed to continuously monitor the dose and current delivered to the wafer. It has two main components: pulse timer and photomultipler tube. The pulse timer produces continuous digital signals providing information about the beam intensity field and the dose at any position on the substrate. The photomultipler tube detects pulses of light that are generated during the ion implantation process. This information is gathered and analyzed, providing feedback on the implantation process. SEN / SUMITOMO EATON NOVA / AXCELIS NV-GSD-80 is designed to deliver high-quality implantation without causing any damage to the substrate. This is achieved by utilizing its powerful power supply, beam scanning and rotation process, and precisely monitored dose and current delivery. SEN NV-GSD-80 is also easy to use and allows for precise conformation of the implantation process. This all makes it an ideal option for fabricating semiconductor devices.