Used SEN / SUMITOMO EATON NOVA HE3 #293792242 for sale

SEN / SUMITOMO EATON NOVA HE3 is an advanced ion implanter & monitor designed for high-precision implantation with excellent reliability. It delivers high-quality and unparalleled performance for production of advanced integrated circuits. SEN HE3 is a versatile, cost-effective platform that provides production-level implantation in a range of process flows. It also offers advanced process controls for stable and repeatable implantation. The state-of-the-art SUMITOMO EATON NOVA HE3 features a two-stage RF generator, advanced beam line geometry with impressive precision and innovative process tools. The high beam current provides efficient implantation for a variety of materials and process parameters. In addition, HE3 combines low beam divergence with high beam current for efficient implantation of ion species. The combination of these parameters make this system ideal for implantation of both shallow and deep operations. The powerful control software of SEN / SUMITOMO EATON NOVA HE3 helps users to achieve excellent repeatability and accuracy. The control system monitors all critical parameters including energy, beam emission current, beam current density, uniformity, cross-talk and particle composition for optimized implantation. It also features recipe-driven autonomous processes, enabling users to effortlessly setup implantation operations. The robust high-frequency power supply of SEN HE3 ensures stable operation and precise processing even in challenging ambient conditions. It also provides over-temperature protection and low-power-loss operation for reliable and long-life operation. With its fast cycle time, advanced process controls, reliable operation, and robust engineering, SUMITOMO EATON NOVA HE3 is an optimal choice for production of ICs with high precision. Its exceptional price/performance ratio makes it perfect for most implantation needs.