Used SEN / SUMITOMO EATON NOVA NV 10-80 #9269133 for sale

SEN / SUMITOMO EATON NOVA NV 10-80 is an advanced electrical ion implanter & monitor designed primarily for the commercial semiconductor industry. This advanced tool is produced by SEN/Sumitomo-Eaton and is widely used for implantation of various ions into a substrate. The device helps to create an atomically-defined substrate with high-resolution ion implantation. SEN NV 10-80 utilizes an electrostatic accelerator with a 400-kV, RFQ superconductor to accelerate the ions to energies ranging from 10-80 KeV. The device features a dual ion-beam source, which allows for batch mode implantation based on a variety of materials. The device is powered by an inverted 4-quadrant magnet power supply for improved plasma stability. Additionally, the device features a positioner for scanning and mounting of the substrate. SUMITOMO EATON NOVA NV-1080 is optimized for a variety of settings in the semiconductor industry, such as beam profiles, radii, and angles. The beam current can be controlled with a power pulse source and is adjustable to allow for efficient ion implantation into the substrates. The anode is designed with variable regulation to enable control of the ion beam energy and current. The device supports an extensive range of active and passive monitoring during the implantation process. For instance, the device features laser light measurement, calibration of the beam current, anode regulation, electron multipliers, etc. The in-situ monitors allow for real-time display of the ion implantation parameters and adjustment of the parameters in case of fluctuations. In addition to the monitoring of the implantation process, SEN / SUMITOMO EATON NOVA NV-1080 also offers features such as beam current adjustment, voltage calibration, and data storage. The integrated data storage capabilities enable users to store and review the implantation data for further analysis. In conclusion, NV-1080 is an advanced electrical ion implanter & monitor designed primarily for the commercial semiconductor industry. This device is capable of delivering high-resolution ion implantation with adjustable energy levels, current, positions, and more. Additionally, the device offers a range of active and passive monitoring during the implantation process, enabling real-time monitoring of the implantation parameters. Finally, the integrated data storage capabilities provide users with the ability to store and review the implantation data.