Used SEN / SUMITOMO EATON NOVA NV-GSD-HC3 #9131090 for sale

SEN NV-GDS-HC3 is a three-axis ion implanter and monitor developed by SUMITOMO EATON NOVA Corporation. It is designed to precisely implant and monitor ions into semiconductor materials. The ion beam source of the NV-GDS-HC3 consists of a multi-beam ion gun that is capable of forming a broad ion beam or separated ion beams for multiple beam injections. The multi-beam formation is composed of electron gun, separated inlet mass spectrometry, and ion acceleration. The ion gun is designed to supply high concentration pure ion beams that exhibit excellent semiconductor characteristics. The NV-GDS-HC3 is equipped with a multi-zone recirculating mass filter equipment that is used to separate desired ions from the ion source. The recirculating mass filter system is composed of a gas mass filter that separates the ion energy and charges, and a recirculating mass filter that removes contaminants and undesirable elements. To accurately monitor the ion implantation process, the Sensing Unit of the NV-GDS-HC3 measures the implantation position, ion species, and ion concentrations. It utilizes optical monitoring techniques to determine the high accuracy three dimensional parameters of the implant targets. In addition, the machine is equipped with a data logging feature that records all implantation and monitoring data for analysis and recordkeeping. The NV-GDS-HC3 also features the Beam Limiter Tool (BLS) which can precisely control the beam width, shape, and electrpotential of the ion beam to optimize its uniformity for improved efficiency. The BLS allows the user to adjust the parameters of the beam during the process for increased accuracy. The Center Drive Asset of the NV-GDS-HC3 provides a high resolution symmetric motion to any direction that allows the user to implant complex patterns that require higher accuracy compared to other implantation systems. The model also allows for a maximum bipolar output of 2mC/cm, which is suitable for wide area implants for large quantities of integrated circuits. To sum up, SEN / SUMITOMO EATON NOVA NV-GDS-HC3 is a three-axis ion implanter and monitor designed for use in the semiconductor industry for precise implant and monitoring. The multi-beam ion gun, mass filter equipment, sensing system, beam limiter unit, and the center drive machine provide a comprehensive solution for the most demanding implantation requirements.