Used SEN / SUMITOMO EATON NOVA NV-GSD-HE3 #9283245 for sale
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ID: 9283245
Wafer Size: 12"
High energy implanter, 12"
(4) FOUP
Energy Range: 10 KeV to 3750 KeV with RTEM (Real Time Energy Monitoring Capability)
UPS: MUF3051-BL
Mass analysis magnet and power supply
Inject flag faraday
Power supply: 3 kW, 13.56 MHz
Does not include Hard Disk Drive (HDD)
LIner Accelerator:
(12) High energy resonator cavities
(14) Quadrupole
Quadrupole Lens and power supply
Final energy magnet and power supply
Resolving faraday
Continuous variable aperature
IBM work station
End station wafer handling:
In-air/In-vacuum high throughput wafer handling system
ULPA filtered wafer handling area
Automatic notch alignment capability with buffer cassette
Integrated dummy wafer fill-in capability
Slot to slot wafer integrity
End station disk:
Two axis variable implant angle
(13) Wafers process disk with direct, 12"
End station dose control:
Real time patented dose control
End station robot: SEN MACOROB 300
End station options:
Valved RGA port on end station resolving
Valved RGA port on disk module
Faraday burn through sense
Facilities utilities:
Feed from bottom
Feed gas box exhaust from top
Facilities cables:
Remote cryo pump compressor cable
Rremote disk chiller cable
High voltage beacon
Main PD assembly
Signal tower light assy
(4) Light CE
Fire safety kit smoke detector
VESDA
60 Hz Standard
Gas box exhaust needs to feed from top
High Voltage Warning Display - English
Gas box:
Gas 1 type Gas box gas type position Ar with HP
Gas 2 type Gas box gas type position BF3 with SDS
Gas 3 type Gas box gas type position BF3 with SDS
Gas 4 type Gas box gas type position PH3 with SDS
Gas 5 type Gas box gas type position PH3 with SDS
MFC2 Unit 8160 10 ccm
MFC3 Unit 8162 5 ccm
MFC4 Unit 8162 10 ccm
MFC5 Unit 8162 10 ccm
Remote rack:
SEN chiller
Heater exchange from FAC
Service PC X-terminal
Door Bypass Switch:
Source head: ELS
3-AXIS Extraction electrode:
Vacuum Cryopump CP2 BROOKS OB-8
Vacuum Cryopump CP3 BROOKS OB-10
Vacuum Cryopump CP7 BROOKS OB-250F
Vacuum Cryopump CP8 BROOKS OB-250F
Vacuum STP-2203C TP1
Vacuum STP-A803C TP4
Vacuum STP-A1303C TP5
Vacuum STP-A803C TP10
Vacuum STP-A1303C TP11
Vacuum STP-A803C TP12
Manual included.
SEN / SUMITOMO EATON NOVA NV-GSD-HE3 is a highly advanced ion implanter and monitor equipment designed for nanostructure fabrication and material research. The system's main components are an ion source, acceleration chamber, monitor, and ASIC (Application Specific Integrated Circuit) modules. The ion source of SEN NV-GSD-HE3 utilizes a dual beam Opti-GSD (Gas Stable Discharge) source that offers a wide range of energy spread and current. This allows the user to precisely control the ion energy distribution and current, making SUMITOMO EATON NOVA NV GSD-HE3 the ideal unit for the fabrication of high-performance nanostructures. The Opti-GSD technology is further enhanced by the use of a dual monitor machine, which provides additional information regarding the source. This provides real-time feedback regarding the source performance, making NV GSD-HE3 both reliable and easy to use. NV-GSD-HE3 also features an acceleration chamber with a wide range of variable acceleration voltages, allowing for high throughput and flexibility. This allows for the production of higher quality nanostructures, with a high degree of precision. SEN NV GSD-HE3 also features an ASIC (Application Specific Integrated Circuit) that offers finely tuned monitor and control settings. This allows for precise control and monitoring of various ion parameters, including beam velocity, beam current, beam shape, dose rate and total ion dose. This technology makes SUMITOMO EATON NOVA NV-GSD-HE3 the ideal tool for research and development. In conclusion, SEN / SUMITOMO EATON NOVA NV GSD-HE3 is the perfect asset for research and development in nanostructure fabrication and material research. It features a dual beam Opti-GSD ion source that offers a wide range of energy and current spreads, making it ideal for precision fabrication. It also features a range of variable acceleration voltages and an ASIC module for precise control and monitoring of ion parameters, making it versatile and reliable. Furthermore, its monitor model ensures real-time feedback regarding source performance, which makes the equipment easy to use. All in all, SEN / SUMITOMO EATON NOVA NV-GSD-HE3 is an excellent system for nanostructure fabrication and material research.
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