Used SEN / SUMITOMO EATON NOVA NV-GSD-LE #9181516 for sale

SEN / SUMITOMO EATON NOVA NV-GSD-LE is an ion implanter and monitor equipment designed to control and monitor the characteristics of ion implantation processes. With its advanced process control capabilities, the system is capable of achieving the highest level of for wafer uniformity, highest yield and product quality and reliability. The unit also offers total integrated solutions for maintaining wafer temperature uniformity, minimizing thermal damage and preventing any damage to the circuit board. The machine consists of an implanter, a monitor and a controller. The implanter is the main component of the tool and consists of an ion source, beam forming units, target and implanter base. It provides the necessary ion beam and helps to achieve the desired characteristics for wafer implantation. The monitor unit is composed of high-sensitivity sensors that measure ion beam intensity, voltage and current values and allow precise control of the implantation process. Finally, the controller provides the whole asset with the control signals required for the automatic operations of the process. The model is capable of performing various implantation processes, including boron, arsenic, phosphorous, silicon, germanium, aluminum, and gallium implantations. In addition, it can be used for both single- and multi-step implantation processes, enabling the simultaneous implantation of multiple ion species into the same wafer. Furthermore, the equipment can be used for Trench and Near-Field Implants. SEN NV-GSD-LE is equipped with an integrated temperature control system, which helps to ensure wafer uniformity and minimize thermal damage. Thanks to its high accuracy (±3°C) and the availability of different temperature control settings, it is ideal for implanting both Si-based and non-Si-based materials. Furthermore, the unit is also capable of controlling the particles' acceleration and deceleration, as well as of providing the necessary preliminary chemical processes. SUMITOMO EATON NOVA NV-GSD-LE also features multiple safety measures to help ensure a safe working environment. This includes an emergency shut down switch in the event of any anomalies, as well as a gas tight sound-proof room that ensures that the implant process is conducted with low levels of noise. In conclusion, NV-GSD-LE provides a comprehensive range of features for automating and controlling the processes of ion implantation and monitoring. By offering high accuracy, short cycle times and accurate monitoring, the machine is an ideal solution for a wide range of applications.