Used SEN / SUMITOMO EATON NOVA NV-GSDIII-180 #9148222 for sale

SEN / SUMITOMO EATON NOVA NV-GSDIII-180 is a high-end ion implanter and monitor for semiconductor processing. The equipment features a unique combination of optics and electronics allowing for precise implantation and reduced thermal disruption of materials. This system is equipped with advanced software and hardware components, allowing it to achieve ultra-high accuracy during operation. SEN NV-GSDIII-180 utilizes a High Resolution Beam Position Monitor (HRBPM) technology for quantitative and accurate implantation and monitoring. With this monitor, the unit is able to precisely control the implantation energy levels, target speed, and dose rate, ensuring high-resolution and repeatable accuracy. The machine is also equipped with a Secondary Electron Detector (SED) which allows for detailed data collection on the response of different materials to the ion implantation. SUMITOMO EATON NOVA NV GSDIII 180 is controlled through a graphical user interface (GUI) which includes a Graphical Implant Tool (GIS). This GIS allows the operator to preset the ion species, velocity, beam current and other variables to adjust implantations. Additional features include computerized Library Search, Diagnostic Monitor, Data Collection, Monitor Data Logging, Histogram Outputs and various preset Kinetic Parameters. The asset is capable of implantation in various materials such as Silicon, Gallium Arsenide, Silicon Carbite, and Germanium. It also supports a variety of configurations, including single-wafer, multi-wafer, batch, double-sided and multiple-stage implantations. NV GSDIII 180 is built with a robust stainless steel construction and features cooling fans to ensure consistent operation of the model. It is equipped with a number of safety features, including a token-ring interlock equipment, beam dump, and an integrated RF shield to ensure operator safety. The system also has a number of options for online data analysis, such as a Radiation Profiling utility or a Network Interface Terminal. To further ensure quality and consistency, SEN NV GSDIII 180 is equipped with a fail-safe observation unit, which prevents any build-up of infiltration debris and keeps the chamber clean. Furthermore, an advanced Vacuum tight monitoring machine allows for precise monitoring of the vacuum pressure in the tool. NV-GSDIII-180 is a state-of-the-art ion implanter and monitor that is capable of providing highly precise and repeatable implantation and monitoring. It is equipped with a number of features including a High Resolution Beam Position Monitor, Secondary Electron Detector, Computerized Library Search, and a Graphical Implant Asset. Furthermore, its robust construction and safety features ensure reliable operation of the model.