Used SEN / SUMITOMO EATON NOVA NV-GSDIII-180 #9148295 for sale

SEN / SUMITOMO EATON NOVA NV-GSDIII-180 is an ultra-high-energy implanter with enhanced beam transmission capabilities and X-Y beam scanning capabilities. It is used for highly precise and delicate implants into semiconductor wafers that enhance device performance and reduce costs. The NOVA SEN NV-GSDIII-180 has a maximum implantation energy capacity of 180 keV and supports a wide range of implantation procedures, including channeling, shallow junction, self oscillation and self-alignment implants. It is equipped with a built-in Faraday cage, vacuum equipment and pneumatics, which provide the highest levels of safety and accuracy for the implantation process. The system has an integrated computer-controlled ion source control unit and a beam monitor that can measure and adjust beam energy, particle flux, focus width and alignment. It also contains a full-length vacuum unit with two stages of a turbo pump and a roughing valve. The machine has adjustable anodes that are used to compensate for magnetic interference, which is important in controlling the parameters of the implantation beam. Additionally, the NOVA SUMITOMO EATON NOVA NV GSDIII 180 contains a degassing unit, digital ion monitors, X-Y mirrors, automatic alignment equipment, profile monitoring and a data acquisition tool with user-friendly software. The asset's digital controls enable precise adjustment of the implant dose. It is capable of performing rotational implants in both clockwise and counterclockwise directions, ensuring a uniform dose across the entire wafer. Its X-Y beam scanning and adjustable focus width capabilities allow for highly precise implants that not only protect but also enhance device performance. The NOVA SUMITOMO EATON NOVA NV-GSDIII-180 has an in-house beam accelerator and shielding to protect the operator from radiation. Its digital communications model ensures reliable and efficient communication between the user and the implanter. Furthermore, the NOVA SEN / SUMITOMO EATON NOVA NV GSDIII 180 has advanced safety features to protect the user from hazardous materials and oxygen deep into the gas delivery equipment. In conclusion, NV-GSDIII-180 is a highly advanced and reliable implanter and monitor. It enables precise and cost-effective implantation of semiconductor wafers by providing maximum safety and accuracy. Its built-in beam accelerator, adjustable anodes, X-Y beam scanning and focus width capabilities, and its advanced digital control make it a perfect choice for anyone seeking high-quality implants without sacrificing cost or safety.