Used SEN / SUMITOMO EATON NOVA NV-GSDIII-180 #9244723 for sale

SEN / SUMITOMO EATON NOVA NV-GSDIII-180 is an ion implanter and monitor designed for wafer-level doping. It provides precise, repeatable ion implantation parameters for a variety of substrate materials. SEN NV-GSDIII-180 includes a computer-controlled ion source, two independent gun line controls, an integrated monitor equipment, and a high-vacuum system. SUMITOMO EATON NOVA NV GSDIII 180 utilizes a computerized ion source which can generate highly accurate ion beams with an optimal cross-section size and shape. The ion source is capable of scanning various areas of the wafer. It can also pulse different beam areas on-the-fly for optimal implantation. The two independent gun lines offer precise control of the implantation process. These lines can be adjusted for a variety of parameters, including spot size and energy, as well as substrate temperature. The integrated monitor unit of SEN / SUMITOMO EATON NOVA NV GSDIII 180 provides real-time feedback of the beam profile and beam energy as the wafer is being implanted. This machine also allows users to monitor the process as it transpires, ensuring optimal performance. A high-vacuum tool provides superior chamber stability during the ion implantation process. This asset is designed to maintain a vacuum of less than 1x10-6 Torr. It also guards against any contamination or degradation of the chamber during implantation. NV GSDIII 180 is an ideal solution for wafer-level doping. Its computer-controlled ion source, two independent gun lines, integrated monitor model, and high-vacuum equipment make it an ideal solution for creating precise, repeatable ionic implantation parameters. Customers can be confident in the accuracy, precision, and repeatability of SEN NV GSDIII 180's ion implanter and monitor.