Used SEN / SUMITOMO EATON NOVA NV-GSDIII-90 #9144805 for sale

SEN / SUMITOMO EATON NOVA NV-GSDIII-90 is an advanced ion implanter and monitor used for implanting ions in substrates to create semiconductor devices. Utilizing the best methods of particle acceleration, this device is capable of accelerating ions up to a speed of 200 keV (200,000 eV) per charge. This helps it in providing superior doses of ions with greatest accuracy. The device is well known for its high processing speed as it can implant ions at a higher repeat rate, thus leading to increased productivity and better defining the feature size with greater precision. It has an in-chamber thermal shuttering system that provides excellent dose uniformity. This helps in improved device control and lower instances of ion damage. The device incorporates a new high-speed feature extraction and ionization (HFEXI) technique that improves ion implant performance and minimizes thermal-buildup and ion range spread. This helps in providing highly controlled doses of ions with improved end result. The device is capable of controlling up to 8 bipolar electrodes while accounting for the electron-electron interaction in the multi-electrode system. This makes it possible for the device to provide better implanting speed and better quality ions. The device also provides various functions such as auto-mode, program generation, jog-mode, data logger, event recorder, dose monitor, clock, OCR coding function, remote control, remote file transfer, recipes management and power interruption. All these features help in providing an easy-to-use, reliable and accurate implanting performance. The device has several safety features such as a three-way interlock system, fault alarm and emergency stop for added safety. This monitors and keeps the implanter in optimum functioning. SEN NV GSDIII-90 implant and monitor has won numerous awards such as the Best in Class award for its high performance and reliability. It is also a great choice for cost-efficient, high-performance implanting for various applications. It provides an excellent and reliable platform for a wide range of implanting operations.