Used SEN / SUMITOMO EATON NOVA NV-GSDIII-90 #9181903 for sale

SEN / SUMITOMO EATON NOVA NV-GSDIII-90 ion implanter is a high-performance device that is used to accurately implant a wide range of ions into a substrate at a precise depth and width profile. It is designed to work with a range of substrates such as silicon, germanium, gallium arsenide, and diamond. SEN NV GSDIII-90 can accommodate a wide range of ion species, ranging from protons to lithium. It is also capable of implanting ions in different temperatures. This implanter uses a single beamline vacuum equipment, which features a 2-stage mechanical vacuum decelerator. This decelerator enables the ions to travel through the system at a controlled rate, and also prevents them from spreading out onto the target substrate. SUMITOMO EATON NOVA NV GSDIII 90 features a high-accuracy focusing and scanning unit. This machine enables the device to maintain a steady state beam intensity and focus throughout the implantation process. The tool also enables it to deliver uniform ion implantation depth profiles, and also to machine flat substrates with uniformized doses across the wafer faces. SEN / SUMITOMO EATON NOVA NV GSDIII-90 is equipped with an enhanced ion implantation monitoring asset that enhances its accuracy. The operations of the model are monitored by an on-board computer, which keeps track of the operating parameters, such as ion current, voltage, dwell time, and beam energy. This monitoring equipment also helps to detect and isolate implanter-related anomalies before they affect wafer quality and process yield. The computer can also be used to store the implantation data for further analysis. SUMITOMO EATON NOVA NV GSDIII-90 is a highly reliable and self-monitoring ion implanter & monitor. It features safety mechanisms to reduce the risk of accidents and malfunctions due to high levels of radioactivity. The device has been thoroughly tested for safety, accuracy, and reliability to ensure that it can deliver consistently high-quality results.