Used SEN / SUMITOMO EATON NOVA NV GSDIII-LE #293746345 for sale

SEN / SUMITOMO EATON NOVA NV GSDIII-LE (GSD3-LE) is an advanced ion implanter & monitor recently developed by Sumitomo Electric and Eaton Corporation. This equipment is best suited for high precision, low-level implantation processes. It makes use of sophisticated advanced technologies such as multi-grid composition acceleration, beam control, and state-of-the-art ion optics. The versatility of GSD3-LE makes it ideal for many applications such as SEMI specification profiles, implant process development and production, advanced implant process control, and ultra-precise implantation. Utilizing a specially designed ion source it can achieve beam energies up to 30KV. The source can also be operated with either Ar or SF6 gases to minimize source downtime for maintenance. The GSD3-LE enables a wide range of implants with low-level accuracy and reliable beam control. Its proprietary laser transmission source offers high-end deposition rates to achieve precise control of beam energy and direction over the entire scan range. The multi-grid acceleration section provides a stabilized and linear implant profile, thus ensuring high-quality implants. The integrated facility control system enables easy and seamless programmable control of the entire implant process. Its high accuracy beam current monitoring of each implant with an automatic wafer hold-off functions can help reduce process variability. The GSD3-LE also features a beam diagnostic which allows engineers and technicians to observe, study and analyze the exact behavior of the beam during mid-process as well as at start / stop of implantation processes. To summarize, SEN NV GSDIII-LE is an advanced ion implanter & monitor suitable for high precision, low-level implantation processes. Its sophisticated technologies and design enable it to achieve precise beam control and highly accurate implant profiles. With its integrated facility control system and beam diagnostic functions, it provides a reliable and easy to use platform for implant process development and production.