Used ULVAC EBX-10DIP #293649703 for sale

ULVAC EBX-10DIP
ID: 293649703
Vintage: 1982
Ion implanter Front door type 1982 vintage.
ULVAC EBX-10DIP is an ion implanter & monitor manufactured by ULVAC Technologies, Inc. It is an advanced equipment designed to provide the highest level of precision and accuracy when it comes to ion implanting processes. It is ideal for applications such as implantation of high-density memory devices and other devices that require more accurate and precise ion implantation. EBX-10DIP is based on a Tandem Ion Implantation System and features a compact, high-powered shape. It is capable of implanting ions at very high energies as well as offering unparalleled accuracy and precision in the implantation process. The unit also features an advanced particle beam architecture which ensures smooth and accurate implantation of ions into the target surface. The machine is also designed to be highly user-friendly and features intuitive graphical user interface (GUI) for easy control and operation. The monitor of the tool is designed to provide users with real-time analysis and feedback on the implantation process. It has the potential to determine the dose, dose rate, beam current and energies, as well as monitor and analyze the progress of the implantation process. The monitor can also be used to analyze various parameters such as the implant profile shape, dose uniformity across the set area, and more. In addition, the asset is equipped with a number of safety features and procedures, including a safety interlock model. This ensures that operations are performed correctly and without incident. The equipment also boasts a number of advanced diagnostics and measurements capabilities, which enable users to precisely examine and analyze their implantation results. Overall, ULVAC EBX-10DIP is an advanced, high-precision and reliable ion implanter & monitor. It is highly user-friendly, enables precise implantation processes, and features a number of advanced safety features and diagnostics capabilities. This makes it an ideal choice for applications that require precise and accurate ion implantation.
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