Used ULVAC IDZ-8001 #9284131 for sale

ULVAC IDZ-8001 Ion Implanter & Monitor is an advanced ion implantation equipment designed to deliver precise ion fluence to a variety of substrates. The system utilizes a high resolution and ultra-precise beam current and voltage control unit to provide continuous and optimal control of the beam parameters for superior implantation quality. The powerful IDZ-8001 platform consists of two major elements: the ion source and the beam control unit. The ion source is designed to utilize the most advanced ionization methods available to provide efficient and reliable ionization of both noble and rare gas ions. The ion source also features an integrated neutralization chamber to ensure maximum efficiency of ion implantation. The advanced ionization methods used in the ion source allow for a wide range of implantation process parameters to be optimized, providing greater process flexibility and consistency. The beam control unit of ULVAC IDZ-8001 provides accurate and stable monitoring of beam parameters during implantation. Its advanced control algorithms ensure efficient implantation and minimize the effect of errors. The machine is equipped with a powerful and flexible interlock tool. This asset allows the user to protect delicate substrates from damage due to unexpected implantation conditions. Additionally, the interlock model has the capability to monitor ion fluence and energy at all times to maximize implantation precision. IDZ-8001 also uses a unique high-precision beam presence detector for optimum beam accuracy. This detector is able to detect the presence of an ion beam in both X and Y directions with sub-micron resolution. The beam presence detector allows the equipment to adjust the beam parameters quickly and accurately for optimal implantation in both physical and electrical form. ULVAC IDZ-8001 is an extremely powerful and precise ion implanter & monitor designed for demanding applications. Its powerful ion source, beam control unit, interlock system, and beam presence detector ensure maximum efficiency, accuracy, and flexibility during implantation processes. The advanced control algorithms and interlock unit ensure maximum safety of the delicate substrates and offer unparalleled implantation precision.