Used VARIAN 1000 #9404414 for sale

VARIAN 1000 is a type of ion implanter and monitor used in semiconductor manufacturing. It is used to implant ion species into the surface of the silicon wafer substrate to create the desired electrical characteristics. 1000 is a radianced, DC and pulsed ion implanter, with a large process chamber and multi-stage acceleration. The ion sources used in VARIAN 1000 are of the Frank-Bodesheim type and can introduce impurities into wafers with a minimum linewidth of 1um. During delivery, the beam is steered and shaped; 1000 supports aligned scanning, ion modulation, energy modulation, and total ion current all in the same wafer run. VARIAN 1000 is designed to provide high beam current, high charge to mass ratios, and long-term operation at temperatures up to 300°C. The implanter has a cryogenic cooling equipment allowing for efficient operation of the source and the target; this helps to protect the wafer material from thermal damage. Its computer-controlled processes are monitored through a Windows-based interface, with user-friendly setup, control and data collection tools. The adopted image analysis and control system allows for real time monitoring of process results, with maximum resolutions of the images acquired reaching 0.1 microns. 1000 also includes a beam digital monitoring unit to accurately measure beam current, position and aspect ratio. This is done by a double emittance monitor machine, with monitors placed at points of full beam overlap and positions of minimum beam intensity. Overall, VARIAN 1000 is an advanced ion implanter and monitor that is suitable for industrial-scale production with its high-definition video cameras and extensive data collection capabilities. It can save companies time and resources in their chip manufacturing processes without sacrificing quality or performance.