Used VARIAN 120-10 #9068892 for sale

VARIAN 120-10
ID: 9068892
Wafer Size: 5"
Ion implanter, 5".
VARIAN 120-10 ion implanter and monitor is a versatile and reliable solution for a wide range of ion implantation processes. It features a unique vibratory feed equipment, which ensures an even ion distribution over the implant sample and a precise accuracy of dose delivery. The self-calibrating ion source and beam optics is designed to optimize the implantation of heavy elements and cover a range of energies up to 120 keV. The monitor module provides a full range of power supplies to accommodate various implantation parameters, including energy, beam current, beam displacement, and time of implantation. It is also equipped with a remote diagnostic control system for precise monitoring and control of all key parameters. 120-10 also features an integrated process unit which can be used to regulate gas pressures, temperatures, background voltage, and magnetic fields for different implantation operations. This machine is designed to increase the total process efficiency and improve throughput. Additionally, the machine is equipped with a beam current monitor and profile monitor tool that aid in alignment and optimization of the implantation process. VARIAN 120-10 also has several safety features to protect users and ensure safety during operation. It is equipped with a vacuum interlock asset that can be used to shut down the beam and protect the beam line, shield, and other components from overpressure or rapid runaway conditions. Additionally, the machine includes an emergency stop button in case of an emergency situation. Overall, 120-10 ion implanter and monitor is a reliable solution for any ion implantation process. Its versatile design and integrated safety features give users the confidence of a reliable operation. The machine is designed to cover a wide range of energies up to 120 keV, ensuring accurate implantation results. Furthermore, its ability to regulate gas pressures, temperature, background voltage, and magnetic fields can optimize the implantation process.
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