Used VARIAN 120-10 #9144961 for sale

VARIAN 120-10 is a sophisticated ion implanter and monitor developed by VARIAN Semiconductor Equipment Associates, Inc. It is the first in its class to offer automatic dose control and high dose rate sensitivity for ionimplantation processes. It features a robust design with an intuitive graphical interface, making it easy to use. 120-10 is composed of two distinct parts: the implanter and the monitor. The implanter allows for controlled and accurate deposition of implanted ion species into a semiconductor substrate. It can handle substrate to substrate variations in implant energies and can handle a wide range of source parameters. The monitor is designed to ensure that the implanter is operating at optimal efficiency during implantation. This includes monitoring and controlling the dose rate, ion energy, and tilt. VARIAN 120-10 offers a variety of features designed to make ion implantation operations easy and efficient. It features a configurable multi-zone wafer stage with a volumetric range of 1.5 mm x 2.5 mm. This allows for exceptionally uniform ion distribution throughout the substrate. It also features tolerance maps and adjustable beam alignment helps to achieve ideal uniformity. 120-10 has an intuitive graphical interface, designed to allow users to easily modify implant parameters and view the beam profile. A wide variety of calibration options are available for advanced control of the equipment. VARIAN 120-10 also features advanced safety features, designed to protect the system from extreme temperatures and electrical surges. Additionally, the unit has an emergency stop button, allowing users to immediately halt any implant processes if necessary. It comes with a variety of programs, which can be used to assess ion distribution and determine critical voltages for advanced processes. This machine is certified to meet the requirements of industrial and laboratory settings. Overall, 120-10 is a powerful and dependable ion implantation tool. It is well suited for industrial and laboratory applications, allowing users to easily and accurately implant ions into semiconductor substrates. The intuitive graphical interface and robust design makes this asset an excellent choice for anyone looking for reliable ion implantation. In addition, the advanced safety features and wide range of calibration options provide users with the peace of mind that this model can be used safely and efficiently.