Used VARIAN 120XP #293592859 for sale

VARIAN 120XP is an ion implanter and monitor developed by VARIAN Semiconductor Equipment Associates, Inc. The equipment is composed of two components, the ion implanter and the monitor. The ion implanter uses energetic beams of ions to implant regions of material densely into a target substrate. It works in a raster scan pattern, allowing for highly precisely controlled implantation areas. The monitor is designed to measure, record, and analyze data from the implantation process in order to ensure optimal results. VARIAN 120 XP is designed for use in the semiconductor industry for dynamic critical device applications. It offers several features that make it especially useful for ion implantation including a large working area, a powerful beam control electrode, and a high-performance etch chamber. Additionally, the system is compatible with a variety of implant source materials including boron, phosphorus, arsenic, and antimony. Its optimized beam spreading also allows for implants to be accurately placed across large substrates. 120XP features an advanced monitoring unit to help ensure that implants are performed accurately and precisely. It is equipped with two separate control panels - one for the monitor and one for the implanter - that measure the parameters of the beam during implantation. This includes the beam current, the energy fluence, angle of incidence, and the range of energy during the implant process, among other things. Additionally, the implanter and monitors are designed to automatically pause if any irregularities are observed, allowing for corrections to be quickly and easily made when necessary. 120 XP utilizes advanced safety procedures as well. The machine is designed to be as safe as possible, with all personnel needed to maintain the tool being much further from the beam than many other ion implanters. Additionally, the chamber itself is constructed from highly-radiation-shielded materials to protect personnel from any hazardous radiation emissions. Overall, VARIAN 120XP is an advanced and highly-capable ion implantation asset designed for use in the production of semiconductor devices. It features a number of features that make it especially useful for high-precision device implants, including a high-powered beam control electrode, a large working area, and an advanced monitoring model. Additionally, its construction is highly safe and efficient, making it a desirable option for high-quality production.