Used VARIAN 1216-04 #184083 for sale

VARIAN 1216-04 Ion Implanter & Monitor is a high-end ion implanter system used for implanting ions into a substrate. It is manufactured by VARIAN Semiconductor Equipment, Inc., and is one of the most popular ion implanters in the semiconductor industry. 1216-04 system has been designed for reliable and precise implantation of aggressive ions such as boron, arsenic, gallium, and phosphorus. It is equipped with a unique ion beam source configuration capable of creating uniform, low-energy beams that are essential for device applications requiring conformal and low-threshold implants. Furthermore, its high-efficiency operation produces high-energy beams that allow higher output current and can be adjusted quickly according to the needs of the task. In addition to its ion implantation capabilities, VARIAN 1216-04 also has integrated monitoring capabilities. This monitor can detect the implantation parameters, such as beam current and dose, enabling users to monitor and adjust process parameters during the implantation process. Furthermore, the system can detect potential drift in implantation parameters, allowing users to take corrective action to ensure the quality and accuracy of the implantation process. 1216-04 is one of the most advanced systems in the semiconductor industry. It is specifically designed for extreme ion implantation applications and can be used for a wide range of materials. It features efficient ion beam generation and process monitoring capabilities, as well as a stable power supply to ensure consistent and quality results. Furthermore, its powerful data acquisition and analysis features allow for fast and reliable implant optimization and results.