Used VARIAN 1500 #9404415 for sale

VARIAN 1500 is a high voltage, high current, high resolution ion implanter and monitor equipment designed for the largest and most demanding ion implantation needs. 1500 is capable of reaching doses of up to 7.51014 ions/cm2 and offers a wide range of dose ranges, as well as high implantation accuracy and repeatability. It has a 16-way wafer chuck that can be combined with a 4" Quad Chuck in order to achieve up to 8" wafer implantation. It features a very large area uniform electron beam in order to avoid contamination and minimize beam narrowing which can reduce dose uniformity. VARIAN 1500 includes a number of features to improve its abilities. This includes data acquisition software that allows users to control, monitor, and diagnose the system. The real-time monitoring of wafer position and rotation ensures accurate implants as well as its ability to store and execute up to 1024 recipes. It has an integrated planarization module for improved conductivity, as well as an active chip out guidance unit for optimum wafer edge trimming. The monitor machine also provides users with a clear view of the sample during implantation, with the ability to draw lines or circles on top of the image to accurately guide the beam. 1500 can be integrated with a selection of VARIAN auxiliary systems to further enhance its operation. This includes the Real-Time Feedback Tool, which can detect and correct beam drift during implantation better than standard systems, the Focus Tuning Asset, which allows users to fine tune the focus of the beam edge, and the Contamination Monitor Model for improved vacuum equipment performance. It can also be integrated with VARIAN Dose Corrector System to ensure accurate dose delivery regardless of operation conditions. Overall, VARIAN 1500 is an excellent choice for large-scale ion implantation needs. Its powerful beam, large dose range, and range of integrated auxiliary systems make it ideal for use in production, research, and development of advanced semiconductor materials. Its ease of use and flexible configuration ensure optimal performance for any ion implantation task.