Used VARIAN 160XP #9143121 for sale

VARIAN 160XP is an ion implanter and monitor equipment that is used to implant ions of various materials into a substrate material. This system is capable of implanting materials such as lithium, boron, phosphorus, arsenic, and other materials into substrates such as silicon, Gallium-Arsenide, and other materials. This unit is a high dose implanter and can implant at a dose rate of up to 450K ions/cm^2/sec. The maximum fluence (total amount of ion implantation) that can be achieved is 6.5E13 ions/cm^2. The machine can also control the layout of the ion beams with its beam controlling tool, which consists of a wafer transport asset and a beam regulating model. The wafer transport equipment uses a stationary source of ions that is then moved and rotated by the beam regulating system. The beam regulating unit on VARIAN 160 XP can rotate up to +- 50 degrees and can focus and shape the beam at a distance of up to 40 cm from the source. In addition to implantation, the machine also includes several monitor systems that can be used to monitor the implantation process and the quality of the implanted material. This tool includes a range of detectors such as a photodiode array for depth resolution of up to 6.0 nm, a Faraday cup for ion current measurement, and a Secondary Ion Mass Spectrometer (SIMS) for diffusion coefficient measurements. All of these detectors can be used to ensure a high-quality implantation. 160XP also includes a user-friendly interface that allows users to easily configure the asset and set up various parameters to optimize implantation parameters for different substrate materials and ion types. The model also includes a very well documented calibration and maintenance manual to ensure proper functioning of the equipment throughout its lifetime. In conclusion, 160 XP is an excellent choice for users requiring a high-quality ion implantation system. It is capable of providing an implantation dose rate of up to 450K ions/cm^2/sec, and its implantation capabilities can be easily adjusted and optimized for different substrate materials and ion types. It includes a range of detectors for monitoring the implantation and diffusion coefficients of the implanted material, and its user-friendly interface allows for quick configuration of the unit. VARIAN 160XP is therefore an ideal choice for users in need of a reliable and high-quality ion implanter and monitor machine.