Used VARIAN 160XP #9182285 for sale
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ID: 9182285
Wafer Size: 4"
High current implanter, 4"
Can be converted to 6"
Maximum beam current: 10 Ma
Implant angle: 7°
RLS Wafer exchange system
(4) Gases:
Phosphine
Arsine
Boron & argon.
VARIAN 160XP is an advanced ion implanter and monitor which is specifically designed to deposit a range of different ionic species in solid materials. This makes the device ideal for applications like semiconductor processing, microelectronics research, and lithography. With its versatile and advanced features, VARIAN 160 XP is a great choice for applications that require accurate and precise ion implantation. Using precise and reliable beam-forming optics, 160XP allows for the deposition of ionic species with a wide energy range, with a minimal amount of energy spread. This means that users can easily adjust the device's beam focusing mechanisms to make sure that the species is being implanted at the exact energy range required. Furthermore, 160 XP is a highly efficient implanter which can operate in pulsed or continuous mode. By allowing users to operate the device in pulsed mode, the implanter is able to reduce the total beamlet time, thus effectively lowering the dose rate and reducing the total beam energy consumption. This helps to save both time and energy. VARIAN 160XP's beam monitoring system also ensures its accuracy in terms of dose and beam stability. It consists of a six-axis beam angular monitor, alongside a wide-range beam profile monitor. The former measure angular variations in terms of both the transverse motion and the nominal beam location, while the latter checks the beam profile characteristics. The implanter also includes advanced safety features to protect against any beam-related accidents which may occur. Such features include beam interlocks, beam intensity monitors, and dose-rate monitors. These monitors prevent users from accidental exposure to over-pressurized beams or fields, helping to ensure their safety. Overall, VARIAN 160 XP is an advanced ion implanter and monitor which can be used for precision implantation of a range of ionic species. With its accurate and efficient operation, it is an ideal tool for microelectronics research and semiconductor processing. Furthermore, its safety features make it a dependable and reliable choice for users.
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