Used VARIAN 160XP #9275791 for sale

VARIAN 160XP is a high-end ion implanter and monitoring equipment designed to provide manufacturers with a reliable and robust means of implanting ions into substrates. It is a fully automated, computer-controlled system that is capable of up to 10 kHz implantation rates and a beam current measurement accuracy of 1%. This makes it the perfect choice for the high precision and repeatability needed in semiconductor manufacturing. The unit is designed with a light weight design to provide a space saving solution, and it also features an ergonomic workstation for maximum efficiency and comfort. The core components of the machine include the pre-amp device, which is responsible for precisely controlling the magnitude and direction of the implantation current; a high-precision beam energy monitor, which is used for monitoring the implantation energy of the beam; and a dedicated ion filter, which is responsible for the removal of any unnecessary ions from the tool. The entire asset is designed to minimize the risk of radiation leakage and ensure a safe working environment for those using it. The model also offers a variety of precision engineering options, such as the ability to specify tilt angles, multi-step implantation processes and computer-controlled dose adjustment. The equipment is also able to switch between different types of ions and conduct implantation on multiple materials, allowing for more control and flexibility in the production process. Additionally, the system is designed with a high level of automation, making it easy to use and reducing the need for manual input. For added security, VARIAN 160 XP comes with an advanced safety protocol, ensuring that no unnecessary radiation is released from the unit and that contamination is kept to a minimum. Furthermore, the machine also comes with a comprehensive series of diagnostics and online support, allowing users to monitor the tool and get support if needed. Overall, 160XP is a high-end ion implanter and monitoring asset that provides manufacturers with a reliable and robust process for implanting ions into substrates. The model offers a range of precision engineering options and is designed with a high level of automation, making it easy to use and reducing the need for manual input. It also has an advanced safety protocol to help ensure a safe working environment and reduce the risk of radiation leakage.