Used VARIAN 160XP #9382645 for sale

VARIAN 160XP is a specialty ion implanter and monitor for semiconductor material processing. It allows a precise control of the implant dose and type of ions used. It is capable of implanting a wide variety of ions into the semiconductor material with excellent resolution and accuracy. VARIAN 160 XP provides a variable range of beam intensity and energy settings, for precisely controlled and consistent ion implantation. It has a unique dual beam detector, which enables simultaneous measurement of beam current and sample position. This offers convenient control and monitoring of all implant parameters. The unit provides accurate and comprehensive measurements of both total implant energy and dose. 160XP also features a three-dimensional computer-controlled program, allowing a broader range of options for precision implantation. This allows the user to easily make changes to parameters such as beam current, ion type, and pitch in order to quickly alter the implantation. Additionally, 160 XP has a built-in autocontroller for optimal implantation parameters, which can be adjusted depending on the desired application. VARIAN 160XP has an easy-to-use, interactive graphical user interface, making it ideal for the a wide range of implantation applications, from basic oxide implants to complex compound semiconductor implants. It has comprehensive diagnostic features, such as built-in beam current and dose monitor, which makes the analysis of implant parameters and implant quality easier than ever. VARIAN 160 XP is capable of executing up to three implants with a single electron beam. Its versatile design also allows it to be integrated into implantation systems with multiple ion sources. The device is also flexible, allowing for implants into multiple samples with varying implant conditions. 160XP can achieve a very high level of accuracy and precision thanks to its advanced electronic components and advanced software algorithms. It also has a fast response time, making it much more efficient to monitor implantation conditions. 160 XP is an ideal choice for both high-yield implantation as well as complex devices that require precise control of implant parameters.