Used VARIAN 300XP #293830781 for sale

VARIAN 300XP is a high-precision ion implanter and monitor designed and manufactured by VARIAN Semiconductor Equipment Associates. It is designed for use in semiconductor fabrication and research and development applications. VARIAN 300 XP is a highly reliable, high-performance implanter, providing excellent dose uniformity, stability, and maximum beam current. 300XP works by transferring a beam of ions to a target material. The ions are accelerated by a high voltage power supply, resulting in a beam of ions with a specified energy and dose rate. The ion beam is then scanned across the target material surface, implanting the ions into the material. The beam can be moved either in a rectilinear (straight line), raster, spiral, or back-and-forth pattern, with a scanned area determined by the size of the target, any physical mask patterns, or software programs in use. 300 XP can also be configured to provide a wide range of ion energies from 10-150 keV, depending on the desired implantation depth. The beam current can be adjusted over a range of 5-50 mA to achieve uniform dose distribution, or to accommodate changes in the target material's absorption rate. VARIAN 300XP also employs a number of other ion beam modifying techniques such as mass energy binning and energy spectrum scanning, which make the resulting doses more uniform. VARIAN 300 XP includes an advanced monitor system which uses a sensing electrode to keep track of the exact position, voltage and current of the ion beam during implantation. This monitoring system provides a real-time visual feedback to the operator on a video monitor, so that the exact coordinates of the beam's position and the beam's current output can be constantly checked. The monitor system also ensures that the dose rate used is constantly kept within acceptable limits during the implantation process. 300XP is a reliable, high-precision ion implanter, providing exceptional levels of uniformity, stability, and maximum beam current. This makes 300 XP an ideal choice for semiconductor fabrication and research and development applications.