Used VARIAN 300XP #9182165 for sale

VARIAN 300XP is an ion implanter and monitor designed to perform high-precision ion implantation. This device is ideal for making ultra-small structures and other nanostructures, and it is a versatile tool used in semiconductor manufacturing and materials science. This sophisticated implanter and monitor is a product of VARIAN Semiconductor Equipment Associates, a supplier of semiconductor processing equipment. It offers a unique combination of performance and flexibility, allowing users to implant a wide variety of materials and incorporate them into structures with high precision. VARIAN 300 XP can be described as a single-chamber, parallel-plate electrostatic accelerator capable of implanting ions with energies ranging from 50 keV to 1 MeV. It is equipped with a beam entry chamber, a beam irradiation chamber, and several peripheral systems. The beam entry chamber features an ion source holding beam line optics, an ion injector, and two beam deflection systems. The beam irradiation chamber is outfitted with adjustable sources, pressure-controlled chambers, and specialized optics for positioning the ion beam. It also houses a source monitor, a collector detector, an ion monitor, and a Faraday cup to measure the charge in the beam. 300XP offers users unprecedented precision in ion implantation. Its advanced beam-sculpting technology can be used to create precise shapes and structures, and its frequency-controlled ion injectors ensure that ions are evenly distributed in a given space. The implanter can also be equipped with source monitor cameras, which are used to take pictures of the ion beam as it is formed and localized, and used to check its alignment and stability. 300 XP also delivers flexibility in terms of adjusting the beam profile and energy settings. Users can easily modify the beam shape, size, and spot profile without needing to recalibrate each time. This, combined with the pressure-controlled chambers and specialized optics, makes it an efficient tool for producing nanostructures with uniform sizes. This ion implanter and monitor is ideal for those looking for a highly precise and reliable tool for implanting ions in a wide range of materials. Its advanced beam-sculpting technology and adjustable settings provide users with the flexibility to create intricate nanostructures without compromising on accuracy. VARIAN 300XP is a cost-effective solution for producing nanostructures with precision and repeatability.