Used VARIAN 300XP #9232841 for sale

Name: VARIAN 300XP
Brand: VARIAN
SKU: 9232841
Availability: SoldOut

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Ion Implanters & Monitors

Manufacturer

VARIAN

Model

300XP

ID: 9232841

Implanter, 3"-6" Beam energy: 10-200keV (Extendable to 400keV with doubly charged ions) Throughput: 250 Wafer per hour With 10-second implant Wafer breakage <1: 20000 Wafer cooling: ΔT <100°C at 2.0 w/cm² (Air) ΔT <100°C at 3.0 w/cm² (Helium) Particulate count: <0.15 Particles / cm² for particle size >0.5µ <0.05 Particles / cm² for particle size >1.0µ Wafer handling: Cassette to cassette serial processing Dual end stations Full 100 wafer load Vertical wafer handling Cassette and slot integrity Azimuthal wafer orientation Implant angle 0° or 7° fixed.

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VARIAN 300XP is a high-performance ion implanter and monitor designed to deliver and monitor doses of energetic ions across a wide range of ranges, energies, and charge states. This system includes a 100 cm long, 2 cm diameter ion gun for the production of implant species, a stepped beam line to control the energy of the ion beam, and an integrated monitor chamber and detector for dose and beam state measurement. The gun has an optional high-power radio frequency (RF) heating option to increase the gun energy and a multi-axis collimator to produce a wide range of usable current distributions. The stepped beam line uses permanent magnet optics with electrical tweaking to control the implant beam from full energy to a few hundred volts, and has a set of magnetic and electrostatic apertures to produce a broad range of beam sizes from macro to sub-millimeter. The integrated monitor chamber uses electrostatic optics to focus the implant beam as it passes through, and a combination of secondary electron emission, Faraday cup, and a gas ionization chamber to monitor the beam current, dose rate, and total dose. The chamber is modular and can be used on a variety of different sizes of substrate and wafer. The chamber is designed to provide high current density without sacrificing resolution, with single wafer sizes up to 200 mm supported. The monitor chamber includes an advanced software package to assist in controlling the implant process, with options for manually tweaking the beam parameters to match the desired results, as well as remote control of the system and electron beam writing. The system also includes a comprehensive set of safety features, with hardware and software interlocks to ensure safe operation at all times. VARIAN 300 XP is a reliable and powerful tool for the production of high-quality ion implants, and its integrated monitor chamber and software package make it ideal for high-precision dose control and monitoring of the process. The modular design makes it suitable for both large-scale implants and high-precision research applications, while its safety features and comprehensive software package add peace of mind and ease of operation.