Used VARIAN 300XP #9236850 for sale

VARIAN 300XP ion implanter is a device used for the implantation of ions in semiconductor wafers. VARIAN 300 XP is a production-grade implantation system capable of implanting both Ga and As ions into semiconductor wafers. The ion implanter and monitor use a continuous-flow ion source to implant ions into the wafers, which are then monitored by the ion implanter and monitor. 300XP is capable of delivering ions at specific energies with a wide range of energies from 5 keV to 10 MeV. It has a minimum beam spot size of 1.5mm and a maximum beam spot size of 15mm. Additionally, it has a plasma source for etching thin films and a vacuum thermal evaporation source for depositing metal films. 300 XP has a vacuum monitor and controller which is used to monitor the temperatures and pressures of the gases used in the implantation process and to ensure a safe system operation. It also has an energy monitor to measure the amount of energy imparted by the ions to the semiconductor material. VARIAN 300XP can be programmed to change the implant and e-beam parameters. This allows the user to customise the implantation for their desired process. The user can also set up control parameters such as current limiting and energy control. VARIAN 300 XP is a reliable and efficient ion implanter. It has a good yield and a consistent beam spot size. Its safety features ensure a safe operation of the system and the adjustable parameters allow the user to customise the implantation according to their needs.