Used VARIAN 300XP #9302574 for sale

VARIAN 300XP is a high-precision ion implanter and monitor used in semiconductor fabrication. It provides accurate and precise beam control for a variety of applications, including semiconductor deposition, ion implantation, and wafer cleaning. VARIAN 300 XP is a direct current (DC) source that uses a stable and accurate beam current to achieve high resolution ion implantation. This allows for a low-background implantation of smaller ions into large and small areas of material. The equipment can also implant high energy ions, offering an advantage over other implanters. 300XP also features a variable-energy ion source, allowing for the adjustable energy setting to provide a precision and repeatability needed for implantation of material layers. 300 XP is capable of outgassing, evaporation, sputtering, and substrate etching applications. The system offers a wide range of materials and ion species to be implanted in a wide range of substrate types. The unit has an on-axis beam-scanned position resolution of 1.9 μm, allowing for small features to be accurately placed onto a substrate. The machine also features a digital memory storage for storing data and algorithms. This memory storage allows for the storing of parameters used in the implantation process. This information can be used to help optimize plant performance and provide repeatability within an application. VARIAN 300XP is equipped with a 30 inch monitor for accurate and detailed analysis of the implantation process. The monitor also includes an intuitive graphical user interface, allowing users to quickly locate and monitor implantation operations. The tool also provides users with remote monitoring and control capabilities to allow users to be alerted of any abnormalities in implantations, as well as the ability to adjust and monitor parameters from a remote location. VARIAN 300 XP is a highly reliable and versatile implanter and monitoring asset, offering high precision and repeatability for a variety of applications. It is one of the most popular and successful implantation systems used in semiconductor fabrication.