Used VARIAN 350D #293595050 for sale

VARIAN 350D is an ion implanter and monitor designed for fabrication of semiconductor devices. It is used for both the ion implantation and rapid thermal processing of semiconductor wafers. VARIAN 350 D has a very wide range of capabilities, enabling it to provide optimal performance for all types of semiconductor devices. 350D is equipped with a high-power pulsed ion source and a high-precision control of beam current and voltage. It also has various plasma etching and cleaning chambers that can be used to quickly clean and etch semiconductor wafers. 350 D also has a low-energy ion bombardment source, allowing for detailed probing and imaging of the structure of the semiconductor material. The imaging capabilities of VARIAN 350D help improve the overall quality of device fabrication. It also has a monitor system which allows the user to visually observe the ion implantation process at any time during the implantation process. The monitor system also allows for optimization of the implantation parameters, such as the beam voltage, current and scan speed. VARIAN 350 D is capable of rapid thermal processing, meaning that it can reach temperatures of 900 degrees Celsius in just a few seconds. This makes 350D ideal for fabrication process which require extremely precise temperatures. 350 D is also capable of multiple species implantation, allowing for the precise incorporation of boron and/or phosphorous into semiconductor material. In addition to its diverse range of features and capabilities, VARIAN 350D also has an advanced safety feature. It has a multi-stage safety system which has been designed to protect the user from electric shock and short-circuiting. This makes VARIAN 350 D safe to use, even in a laboratory or industrial environment. 350D is an extremely versatile and powerful ion implanter and monitor which is capable of providing excellent results for fabricating semiconductor devices. It is equipped with a wide range of features and capabilities, which makes it the ideal choice for both large-scale and small-scale semiconductor device fabrication.