Used VARIAN 350D #293641021 for sale

VARIAN 350D is a high precision, high-current ion implanter and monitor equipment designed for the production of semiconductor wafers. The system is capable of implanting ions of a variety of types, including Boron, Oxygen, and Nitrogen, at a wide range of energies, ranging from 1 keV to 500 keV. The unit is equipped with two separate implant chambers, which allows for simultaneous implantation and data collection from multiple wafers. VARIAN 350 D's electronic control and monitoring machine are equipped with a variety of time-saving features. The beam intensity control tool accurately adjusts the beam current for optimized wafer performance, while the advanced wafer leveling asset ensures uniform implantation. The integrated defect detection model detects flaws in the implant process and enables corrective action to be taken before the wafers are sent for packaging. The equipment's vacuum system includes a high-efficiency turbomolecular pump and adjustable turbo vacuum chamber, which allow for a high-level of process repeatability. The pre-vacuum, as well as the backside chamber pressure and temperature may be optimally adjusted according to the required processing parameters. The unit's two high efficiency 10-zone crucibles enable simultaneous implantation of up to 10 wafers. The fully automatic end-point detection machine accurately monitors the chamber variables to ensure the best implant process possible. 350D delivers a level of precision and accuracy that is needed to produce high quality, high performance semiconductor devices. This tool ensures high throughput production, minimizes downtime, and reduces overall costs. It is a reliable, high-performance asset that is ideal for use in all types of semiconductor production operations.