Used VARIAN 350D #293641024 for sale

VARIAN 350D is a heavy-duty, high-accuracy ion implanter and monitor for semiconductor wafer processing. It is designed for high-volume production needs with a wide range of implanting parameters, high process accuracy, and low cost of ownership. VARIAN 350 D is a single-ended, four-zone dual-gun equipment featuring VARIAN electron beam source and new turbine-based accelerator technology. Pulsed X-ray ionization ensures optimal control of ion counts. The system includes a 46-channel arc collimator with precision closed-loop control and a 100 kV variable pressure gun. The implanter's beam spot size is adjustable based on need and substrate, with the ability to create a wide range of implant geometries and beam profiles. The unit is designed for flexibility and easy operation. Its multi-station interface enables the simultaneous control of multiple processes, allowing for efficient implant runs. The machine feature intuitive alarm warnings and a real-time feedback of process conditions and parameters throughout the implant process. Additionally, 350D features an advanced beam energy control tool for automated adjustment of the optimization and accuracy of all beam energy settings. 350 D has a maximum beam current of 250 mA, a maximum voltage of 75 kV and a beam energy range from 0.2 keV to 1.0 keV. A wide range of substrates can be implanted at any dose rate, with a maximum dose rate of 2000 neV/cm^2.s and a maximum wafer size of 7 inches. The asset offers high accuracy levels, low sputter and improved uniformity. In addition, advanced maintenance and diagnostic features enable the monitoring of model performance and provide support for preventive maintenance activities. VARIAN 350D is a reliable and efficient ion implanter and monitor. Its high accuracy levels and fast implant times enable it to handle challenging substrates and enable long-term cost-savings and process improvements. Its advanced features and multiple configurable parameters provide users with the flexibility needed to meet modern semiconductor production needs.