Used VARIAN 350D #293765991 for sale

VARIAN 350D is a state-of-the-art ion implanter and monitor equipment used for semiconductor processes. This versatile device can be used for a range of applications such as doping, annealing, and ion milling. The system consists of an implanter, monitor, and multiple computer systems to control the unit. The implanter uses energy and magnetic fields to accelerate ions to the target wafer, where they are implanted in the surface to achieve different chemical and electrical properties. The monitor is used to measure the ion current and to ensure that it is within acceptable limits. VARIAN 350 D is based on a single-ended accelerator design and features an Aluminum-Ceramic Optic (ACO) Lens, which is a patented linearly-graded lens machine that provides a high-quality beam spot for reliable and repeatable implanting. The ACO lens has an adjustable focus that can be adjusted to ensure a uniform implant density at a specific depth in the wafer. The tool also has an integrated computerized control asset and user interface, which can be used to monitor and modify the implanting process. 350D is an accurate and reliable implanter and monitor model, capable of performing high-precision and controlled processes for high-volume production semiconductor manufacturing. It is designed for the highest degree of process flexibility, offering a range of beam spot sizes, currents, doses, and energy levels, as well as a variety of beam types, such as single beam, duo beam, multi-beam, and combined beam. The device also features a unique SIMPLE programming language and data acquisition equipment, which allows users to store and recall various process parameters. The system is also equipped with limit check and warning systems, which help to ensure that all implantation parameters are within the safe limits and that any out-of-tolerance conditions are quickly identified and corrected. In conclusion, 350 D is a reliable and efficient ion implanter and monitor unit. It is capable of accurately implanting different dopants and ions into wafers and has a range of features and tools, such as programmable limit checks and a SIMPLE data acquisition, that help to ensure all implantation processes are precise and repeatable. The device is ideal for high-volume production applications and is sure to be a valuable asset to any semiconductor manufacturer.