Used VARIAN 350XP #293600209 for sale

VARIAN 350XP is an ion implanter and monitor designed for use in semiconductor processing applications. The system consists of a pre-radiating chamber and vacuum-tight implanter head, as well as a digital signal processor for control and data acquisition. The pre-radiating chamber module houses the main ion source, an integral mass separator, and an internally-sited computer for generating and monitoring the desired beam properties. This section of the machine is separated from the implanter chamber, allowing for rapid implantation without successively having to re-establish parameters. The implanter module is composed of a chamber with a single axis gantry, vacuum-tight gate valve, and integrated mass spectrometer. The design allows for a variable dwell time, as well as variable position along the gantry. The implanter source has a low-temperature operation range and can be used to implant ions of all types, including heavy ions such as plutonium and aluminum. The internal shielding minimizes backscattering and reduces the amount of sample contamination. The integrated monitoring and control system utilizes a digital signal processor (DSP) to facilitate accurate implantation and to ensure the required parameters are being maintained. This allows for automated adjustment of the beam shape and mass, and monitors process conditions such as chamber pressure. 350XP is designed to enable rapid, reliable, and accurate tracking of sample positions without compromising on accuracy or quality. It can be used to implant ions of all energies, from a few tenths of a keV to several mega electron volts, and is suitable for use on a wide range of materials, including semiconductor wafers and nanowires. The system is highly intuitive and user friendly, making it a great choice for those in the semiconductor processing industry.