Used VARIAN 400-10 #9105618 for sale

VARIAN 400-10 is an ion implanter and monitor used in semiconductor manufacturing. It is used to introduce atomic-scale particles, such as boron, phosphorus, and arsenic, into surfaces and layers of semiconductor materials. This technique is called ion implantation and is used to create transistors, diodes, and other semiconductor devices. The basic components of 400-10 include an ion source chamber, an ion beam generator, a 3-dimensional scanning device, and a Faraday cup. The ion source chamber houses the target material to be implanted, as well as sets the energy of the ions. The ion beam generator accelerates the ions, allowing them to implant into the targeted material. The 3-dimensional scanning device is used to ensure an even coverage of the desired area. The Faraday cup detects the amount of current passing through the ion beam and is used to measure the dose of ions being implanted. VARIAN 400-10 allows for precise control over the implantation process. The energy and dose of implanted ions can be adjusted to match the properties of the targeted materials. The 3-dimensional scanning device allows for a precise coverage of the desired area, ensuring an even depth of the implanted ions. Additionally, the operation of the system can be monitored to detect any potential errors or malfunctions. 400-10 also includes several features that allow for improved safety and reliability. The ion beam is enclosed in a vacuum chamber to prevent any exposure to the environment. Additionally, the machine is equipped with an advanced alarm system, designed to alert the operator of any potential hazards. Overall, VARIAN 400-10 is a reliable and advanced implanter, capable of accurately introducing atomic particles into targets for a variety of semiconductor applications. Its precise control over the implantation process, as well as its safety features, make it an ideal choice for industry professionals.