Used VARIAN 8010 #9068893 for sale

VARIAN 8010 is an ion implanter and monitor designed to deliver precise doses of high-energy ions used in semiconductor and other high-tech device fabrication. Ions are injected into a substrate material, such as a semiconductor wafer, to create the desired pattern of conductive layers. 8010 is an important tool for fabrication, as it provides accurate control over the dosage of ions that are injected. VARIAN 8010 includes an ion source and two precision ion implantation systems. The ion source provides the high-energy ions that are used to implant contaminants in the substrate. The two implantation systems include an accelerator and a decelerator, which control the speed of the ions before and after they reach the substrate material. The accelerator speeds up the ions to high velocities, while the decelerator slows them down before they reach the material. The monitor of 8010 is designed to ensure that the correct, predetermined dose is delivered to the substrate. It uses a variety of sensors and detectors to measure the amount of ions delivered. The monitor also supplies information about the current conditions of the implantation process, including the Power Supply voltage, Process current, and the exposure dose to the substrate. This information helps operators ensure that the dose delivered is accurate and appropriate for the substrate. VARIAN 8010 also includes a variety of safety features designed to protect both the substrate material and the operator from potential hazards associated with ion implantation. These features include protection against radiation, over-voltage, over-temperature, and over-pressure. The system also includes a number of diagnostic tools, such as alarms and automatic shut-off, to detect potential issues associated with the implantation process before they become dangerous. In conclusion, 8010 is a high-precision ion implanter and monitor designed to safely and accurately deliver high-energy ions used in a variety of high-tech device fabrication processes. It provides reliable control over the dose of ions delivered to the substrate using a combination of the ion source, implantation systems, and monitoring tools. The system also includes a variety of safety features to ensure the safety of both the substrate and the operator.