Used VARIAN 8010 #9269115 for sale

VARIAN 8010 is an ion implanter and monitor manufactured by VARIAN Semiconductor Equipment Associates that is used for the ion implantation of semiconductor wafers. 8010 offers a high-precision instrument that can implant ions in a wide variety of materials including silicon, germanium, indium, and gallium arsenide. VARIAN 8010 is designed with two Philips-based implanters (PVF-4/2 and PVF-4/4) as well as a single servo-motor based implanter (VARIAN 8100). The 8100 implanter is capable of automatically controlling the entire implantation process in order to maximize accuracy and precision. 8010 has several features that make it an ideal choice for ion implantation. The first is its ability to take a wide range of substrates, allowing the user to create devices from a variety of materials. VARIAN 8010 also has a variable current range, which allows for a wider range of particle energies to be implanted. 8010 has an advanced beam pulsing equipment, which accelerates ions to a higher energy than static systems. This pulsing system increases the uniformity of the particles and also allows for the adjustment of the energy distribution across the wafer. VARIAN 8010 also has a highly sophisticated monitoring unit that can continuously monitor the substrate and the implanted ions throughout the entire implantation process. This machine collects data on the dose, current, temperature, time, voltage, and other parameters and provides an immediate feedback to the user on the progress of the implantation. 8010 also has a comprehensive interface that allows users to configure implant parameters as well as monitor and analyze the resulting implanted ions. VARIAN 8010 allows for an extremely accurate and precise ion implantation. It has the capability to produce devices with beam spot diameters ranging from 25μm to 250μm, depending on the configuration. 8010 also has an optional depth monitor tool, which can prevent excessive particle penetration into the substrate. In short, VARIAN 8010 is an ion implanter and monitor asset that provides an efficient and precise way to implant ions into a wide variety of substrates. 8010 is highly accurate and can produce devices with beam spot diameters ranging from 25μm to 250μm. Additionally, VARIAN 8010 has an advanced monitoring model and an interface for configuring and monitoring implant parameters. All these features make 8010 an ideal choice for ion implantation.