Used VARIAN AAS 30 #293672532 for sale

VARIAN AAS 30
ID: 293672532
Implanter.
VARIAN AAS 30 is an ion implanter and monitor used for specialized ion implantation processes. It is a high-precision, reliable tool designed for working with difficult semiconductor technologies such as pharmaceutical, medical, and aerospace/defense applications. It offers excellent performance capabilities, including precise beam control with a high ion current range of up to 800mA and a wide range of implanting angles up to 45 degrees. This ensures that optimal ion material depth and distribution are attained in every process. AAS 30 uses variable magnetic field technology (VMF) to provide its advanced ion implantation capabilities. It features a source to target distance of up to 30 inches, a large beam-defining aperture size, and finely adjustable beam divergence. The rotating sweep control also enables beam drift corrections to be made quickly. In addition, the machine is equipped with fast-response thermoelectric coils for dynamic beam emittance control, ensuring stable beam characteristics during the implantation process. VARIAN AAS 30 also offers excellent end-point monitoring capabilities for thorough process control. An integrated energy monitor, for instance, gives a continuous readout of electron current inside the chamber, even when the implantation is carried out at low beam voltages. Furthermore, a temperature-controlled thermal sensor provides accurate measurement of chamber temperature for an improved thermal environment. An ion beam monitor also ensures that the beam current remains within specified limits for secure implant runs. The machine also offers a user-friendly software package for convenient operation of the source. Its Graphical User Interface (GUI) offers clear prompts and a wide range of controls, making the implanter easy to operate and customize. The package also provides a powerful simulation program that enables users to carry out production runs in a virtual environment. To sum up, AAS 30 is an advanced, reliable, and high-precision ion implanter and monitor for advanced applications. It is an excellent choice for those looking for a reliable and accurate control system for implantation projects.
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