Used VARIAN / AMAT / APPLIED MATERIALS E11072881 #293656610 for sale

VARIAN / AMAT / APPLIED MATERIALS E11072881 ion implanter and monitor is a high-performance equipment designed for doping in integrated circuits and other electronic devices. It is equipped with ultra-high bias and low-energy implantation capabilities, allowing for precise control of doping depths and concentrations. The system is based on a difluorobenzene (DFB) electron-bombardment ion source, which provides a high degree of ion beam uniformity and stability, and is housed in a high-vacuum chamber to ensure clean operation. The source operates at a pressure of about 10-4 Torr and an energy range between 3 and 50 keV. The control electronics of the unit feature a user-friendly, menu-driven interface with automated implantation and process parameters, including beam current, beam voltage, diameter of the beam, control of the beam current, energy range, scan time, and beam focus. The machine also includes a series of safety measures, such as a radiation detector, an emission optics chamber, and an alarm tool for monitoring the operation of the asset. The ion implanter can be used for both medium current and high current implantation. It features a unique dual particle accelerator design that can adapt to the needs of a variety of different implantation processes. The accelerator chamber allows for fast and precise implantation of preprogrammed parameters, and features a variable-coordinate ion delivery model that provides for high implantation rates. The ion implantation monitor equipment can automatically monitor the results of the implantation process, from start to finish, in order to ensure consistent implantation results. The monitor system comprises a series of chamber detectors that measure the energy, current, and other parameters of the implantation process. AMAT E11072881 unit is a reliable and easy-to-operate machine for the implantation of electronic devices. It is well-suited for the fast and accurate doping processes of integrated circuits, and features automated control of implantation parameters. The tool is equipped with safety features such as a radiation detector and an emission optics chamber, and features a user-friendly, menu-driven interface. The asset also includes an enhanced monitoring model in order to ensure consistent implantation results, as well as a series of chamber detectors to measure the energy and current of the implantation process.