Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80 #9217499 for sale

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ID: 9217499
Ion implanter No SMIFs or dry pumps Implant dose performance: Dose range: 2E12 - 1E16, (4E12 – 1E16 ions/cm2 - quad mode) Uniformity: ≥10 keV, 1 sigma ≤1.0% mean dose across wafer 500 eV to 10 keV, 1 sigma ≤1.5% mean dose across wafer Repeatability: ≥10 keV, 1 sigma ≤0.7% mean dose of wafers 500 eV to 10 keV, 1 sigma ≤1% mean dose of wafers Beam parallelism ±1º in X and Y axis for ≥10 keV drift Ion mass resolution: M/DeltaM > 60 FWHM Process angles: Tilt: ±45º; 2 axis; Programable in 1º steps; accuracy ±0.5º Orientation: 0 - 360º; programable in 1º steps; accuracy ± 1º Rotation: Equivalent multi-tilt, quad mode Wafer cooling: Gas cooled electrostatic platen 200mm < 100ºC @ 800 W beam power 300mm < 100ºC @ 1200 W beam power Particulate control: Frontside: ≤0.15 particles added/cm2@ ≥0.16μm particles Max throughput (wph): 200mm, 300mm Min 2 scans (4 passes): ≥250, ≥230 Wafer handling: Backside pick and place wafer orientation Load locks: (2) Independent cassette load locks FOUP/cassette buffer compatible – 4 SEMI E15.1-0298 load ports AGV compatible SMIF compatible Wafer breakage: MWBB 1:100,000 Metals contamination: Al < 50ppm of implanted dose Transition and heavy metals (Fe, Cr, Ni, Cu) < 5ppm of implant dose 1999 vintage.
VARIAN / AMAT / APPLIED MATERIALS VIISta 80 is an ion implanter and monitor that is designed to precisely control the introduction and removal of ions into and from semiconductor materials. This advanced equipment provides users with a reliable and highly accurate tool that can be used to create high-performance semiconductor devices from a variety of materials. AMAT VIISta 80 ion implanter and monitor features a robust design with a built-in interlock system that allows for fast, safe operation. This device also features a proprietary electron beam window option that allows users to rapidly achieve optimal implant depths for their applications. VARIAN VIISta 80 utilizes a host of advanced features to ensure the maximum accuracy and precision when implanting ions. It is designed with sophisticated algorithms that allow for adaptive adjustment of ion implant rates, ion beam alignment, and process parameters. Furthermore, it boasts an advanced wafer alignment unit that is constantly monitored for accuracy and precision. For monitoring purposes, VIISta 80 uses real-time optical beam profiling, which provides users with the most accurate readings on ion concentration levels in their materials. This powerful machine also includes an enhanced beam viewer that allows users to analyze their materials' ion concentrations more accurately. APPLIED MATERIALS VIISta 80 is equipped with a range of protective and safety measures to minimize exposures to dangerous levels of radiation and electrical shock. In addition to this, the device is designed to be fully compliant with industry-standard safety standards. Overall, VARIAN / AMAT / APPLIED MATERIALS VIISta 80 is an advanced ion implanter and monitor that is designed to provide users with optimal performance and reliability when injecting or removing ions from semiconductor materials. This robust tool offers a range of precision control features, protective safety measures, and beam monitors to ensure the highest quality results and a safe working environment.
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