Used VARIAN / AMAT / APPLIED MATERIALS VIISta 80 #9218042 for sale

VARIAN / AMAT / APPLIED MATERIALS VIISta 80 is an ion implanter and monitor that is built as a fully automated equipment for implantation and analysis in semiconductor manufacturing processes. It features advanced implant technology in order to meet industry-standard performance requirements, as well as an integrated wafer-handling sub-system. This unit provides highly accurate and precise dose distribution and uniformity. It is capable of providing high ion flux rates and reliable uniformity in implantation. AMAT VIISta 80 is equipped with two independent ion sources that feature thermal emitters and ancillary ion sources such as D-11 and E-30 triodes, RF gas feed, and X-ray emitter. These components are designed to produce precise doses in a wide variety of implantation conditions. The machine also includes an automated wafer-handling subsystem that is equipped with multiple robots and a movable bridge that can be used to transfer workpieces between the ion implanter and the analysis tool. The automation asset utilizes pattern-recognition software in order to properly orient the wafer on the bridge and to facilitate accurate operation of the multiple tools. VARIAN VIISta 80 is capable of both single-wafer and multiple-wafer implantation. It also features a pulsing model that can be adjusted for either uniform or non-uniform doses to ensure optimal implantation. The equipment further includes optimization routines for both single-wafer and multiple-wafer implantation. Additionally, the system offers advanced monitor capabilities which include beam current, temperature, dynamic range and beam intensity reporting. This reporting tool enables users to assess the beam profile, performance, and dose control of the implanter. APPLIED MATERIALS VIISta 80 is a highly efficient and reliable tool for implantation and analysis in the semiconductor manufacturing sector. It features advanced characteristics that ensure optimal implantation, precise dose distribution, and reliable uniformity. Moreover, the monitoring features offer comprehensive analysis and reporting that enable users to optimize performance and maintain tight process control.